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dc.creatorGreig, Wendy Ellen
dc.date.available2011-02-18T21:16:28Z
dc.date.issued1995-05
dc.identifier.urihttp://hdl.handle.net/2346/15833en_US
dc.description.abstractA toroidal electron cyclotron resonance (TECR) plasma deposition system has been built and tested with an argon plasma. Design considerations for the TECR system will be discussed and improvements for future designs will be presented. Diagnostic techniques were used in the system for comparison with existing ECR and other plasma deposition systems. These diagnostics included a magnetic filed profile of the main deposition chamber and determination of plasma parameters, such as electron temperature, through the use of a Langmuir probe. The results of these diagnostics will be presented, as well as a discussion of the accuracy of a Langmuir probe in an ECR plasma. Finally, the plasma parameters will be linked to the TECR system's suitability for thin film growth.
dc.format.mimetypeapplication/pdf
dc.language.isoeng
dc.publisherTexas Tech Universityen_US
dc.subjectPlasma-enhanced chemical vapor depositionen_US
dc.subjectThin filmsen_US
dc.subjectPlasma electrodynamicsen_US
dc.titleAn electron cyclotron resonance toroidal plasma system for thin film deposition
dc.typeThesis
thesis.degree.nameM.S.
thesis.degree.levelMasters
thesis.degree.disciplinePhysics
thesis.degree.grantorTexas Tech University
thesis.degree.departmentPhysics
dc.degree.departmentPhysicsen_US
dc.rights.availabilityUnrestricted.


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