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dc.creatorChandolu, Anilkumar
dc.date.available2011-02-18T22:30:15Z
dc.date.issued2002-12
dc.identifier.urihttp://hdl.handle.net/2346/18335en_US
dc.description.abstractThis thesis describes the experimental methods employed for the study of thin films grown by Molecular Beam Epitaxy (MBE) or using deposition processes like ebeam evaporation by x-ray diffraction and reflectivity. In chapter-1 I briefly describe the source and generation of x-rays and how they can be employed for the study. In chapter-2 I deal with the physics of diffraction, the various laws that govern the phenomena and the factors affecting it. In the subsequent I deal with the three kinds of measurement namely powder diffi-action, High Angle x-ray Diffi-action (HAXRD) and finally the Glancing Incidence x-ray Reflectivity (GIXR). For each method I describe and illustrate the parameters that can be evaluated from the respective measurements. All the measurements have been done using X-PERT, an x-ray diffraction machine from Philips at Jack Maddox Laboratory- Texas Tech University.
dc.format.mimetypeapplication/pdf
dc.language.isoeng
dc.publisherTexas Tech Universityen_US
dc.subjectX-raysen_US
dc.subjectThin filmsen_US
dc.titleStudy of thin films using x-rays
dc.typeThesis
thesis.degree.nameM.S.E.E.
thesis.degree.levelMasters
thesis.degree.disciplineElectrical and Computer Engineering
thesis.degree.grantorTexas Tech University
thesis.degree.departmentElectrical and Computer Engineering
dc.degree.departmentElectrical and Computer Engineeringen_US
dc.rights.availabilityUnrestricted.


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