Controlled growth of GaN nanowires by pulsed metalorganic chemical
Date
2005-01-11
Authors
Temkin, H.
Holtz, Mark
Aurongzeb, D.
Ahmad, I.
Kuryatkov, V.
Yon, J.
Chandolu, A.
Yavich, B.
Kipshidze, G.
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American Institute of Physics
Abstract
Controlled and reproducible growth of GaN nanowires is demonstrated by pulsed low-pressure metalorganic chemical vapor deposition. Using self-assembled Ni nanodots as nucleation sites on s0001d sapphire substrates we obtain nanowires of wurtzite-phase GaN with hexagonal cross sections, diameters of about 100 nm, and well-controlled length. The nanowires are highly oriented and perpendicular to the growth surface. The wires have excellent structural and optical properties, as determined by x-ray diffraction, cathodoluminescence, and Raman scattering. The x-ray measurements show that the nanowires are under a complex strain state consistent with a superposition of hydrostatic and biaxial components
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Controlled growth of GaN nanowires by pulsed metalorganic chemical vapor deposition G. Kipshidze, B. Yavich, A. Chandolu, J. Yun, V. Kuryatkov, I. Ahmad, D. Aurongzeb, M. Holtz, and H. Temkin, Appl. Phys. Lett. 86, 033104 (2005), DOI:10.1063/1.1850188