Determination of oscillator strength of C–F vibrations in fluorinated
| dc.contributor.author | West, M. | en_US |
| dc.contributor.author | Strathman, M. | en_US |
| dc.contributor.author | Gangopadhyey, S. | en_US |
| dc.contributor.author | Temkin, H. | en_US |
| dc.contributor.author | Harris, H. | en_US |
| dc.contributor.author | Wang, X. | en_US |
| dc.date.accessioned | 2010-11-11T21:04:44Z | en_US |
| dc.date.accessioned | 2012-05-13T17:53:13Z | |
| dc.date.available | 2010-11-11T21:04:44Z | en_US |
| dc.date.available | 2012-05-13T17:53:13Z | |
| dc.date.issued | 2001-05-01 | en_US |
| dc.description.abstract | Fluorinated amorphous-carbon (a-CFx) films deposited by plasma-enhanced chemical-vapor deposition were investigated by Fourier transform infrared transmission spectroscopy and Rutherford backscattering. The proportionality constant between the fluorine concentration and the integrated absorption of C–F vibration modes is 3.5260.331019 cm22, and is constant within experimental uncertainty over a wide range of processing conditions. It is shown that the fluorine content can be accurately determined from the infrared absorption spectrum of a-CFx films. | en |
| dc.identifier.citation | Determination of oscillator strength of C--F vibrations in fluorinated amorphous-carbon films by infrared spectroscopy X. Wang, H. Harris, H. Temkin, S. Gangopadhyay, M. D. Strathman, and M. West, Appl. Phys. Lett. 78, 3079 (2001), DOI:10.1063/1.1371970 | en |
| dc.identifier.uri | http://hdl.handle.net/2346/2095 | en_US |
| dc.language.iso | en_US | en |
| dc.publisher | American Institute of Physics | en |
| dc.relation.ispartofseries | 78;20 | en_US |
| dc.title | Determination of oscillator strength of C–F vibrations in fluorinated | en |
| dc.type | Article | en |
| ttu.department | Nano Tech Center (NTC) | en |
| ttu.email | shubhra.gangopadhyay.ttu.edu | en |